| CPC H01L 21/6835 (2013.01) [H01L 25/0753 (2013.01); H01L 33/62 (2013.01); H01L 2221/68354 (2013.01); H01L 2221/68368 (2013.01); H01L 2221/68386 (2013.01); H01L 2933/0066 (2013.01)] | 20 Claims | 

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               1. A manufacturing method of a light-emitting diode substrate, comprising: 
            growing an epitaxial layer group of M light-emitting diode chips on a substrate; 
                transferring N epitaxial layer groups on N substrates onto a transition carrier substrate, the N epitaxial layer groups on the N substrates being densely arranged on the transition carrier substrate; and 
                transferring at least part of N*M light-emitting diode chips corresponding to the N epitaxial layer groups on the transition carrier substrate onto a driving substrate, 
                wherein an area of the transition carrier substrate is greater than or equal to a sum of areas of the N substrates, M is a positive integer greater than or equal to 2, and N is a positive integer greater than or equal to 2, 
                growing the epitaxial layer group of M light-emitting diode chips on the substrate comprises: 
                forming a first conductivity type semiconductor layer on the substrate; forming a light-emitting layer on a side of the first conductivity type semiconductor layer away from the substrate; and forming a second conductivity type semiconductor layer on a side of the light-emitting layer away from the first conductivity type semiconductor layer, 
                the light-emitting diode chips corresponding to the N epitaxial layer groups on the N substrates are configured to emit light of a same color. 
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