US 12,249,498 B2
Sputter deposition
Michael Edward Rendall, Newbury (GB); and Robert Ian Joseph Gruar, Swindon (GB)
Assigned to Dyson Technology Limited, Malmesbury (GB)
Appl. No. 17/776,721
Filed by Dyson Technology Limited, Wiltshire (GB)
PCT Filed Nov. 10, 2020, PCT No. PCT/GB2020/052842
§ 371(c)(1), (2) Date May 13, 2022,
PCT Pub. No. WO2021/094725, PCT Pub. Date May 20, 2021.
Claims priority of application No. 1916627 (GB), filed on Nov. 15, 2019.
Prior Publication US 2022/0384159 A1, Dec. 1, 2022
Int. Cl. H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); C23C 14/34 (2006.01)
CPC H01J 37/3488 (2013.01) [C23C 14/35 (2013.01); C23C 14/50 (2013.01); C23C 14/562 (2013.01); H01J 37/32743 (2013.01); H01J 37/32788 (2013.01); H01J 37/3435 (2013.01); C23C 14/34 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A sputter deposition apparatus comprising:
a substrate support assembly arranged to support a substrate;
a target support assembly arranged to support at least one sputter target for use in a sputter deposition of a target material onto the substrate;
a plasma generation arrangement arranged to provide plasma for said sputter deposition; and
a cartridge arranged to contain the substrate with deposited target material from the at least one sputter target after said sputter deposition, wherein the cartridge comprises the target support assembly, and the at least one sputter target supported by the target support assembly,
wherein the cartridge is configured as removable from the sputter deposition apparatus, and upon removal the cartridge contains each of the target support assembly, the at least one sputter target supported by the target support assembly, and the substrate with the deposited target material after said sputter deposition.