US 12,249,480 B2
Fluid transfer system in a charged particle system
Marcus Adrianus Van De Kerkhof, Helmond (NL); Jing Zhang, Eindhoven (NL); Martijn Petrus Christianus Van Heumen, Santa Clara, CA (US); Patriek Adrianus Alphonsus Maria Bruurs, Baarle-Nassau (NL); Erheng Wang, San Jose, CA (US); Vineet Sharma, San Jose, CA (US); Makfir Sefa, San Jose, CA (US); Shao-Wei Fu, San Jose, CA (US); Simone Maria Scolari, Eindhoven (NL); and Johannes Andreas Henricus Maria Jacobs, Veldhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Apr. 23, 2024, as Appl. No. 18/643,379.
Application 18/643,379 is a continuation of application No. 17/179,165, filed on Feb. 18, 2021, granted, now 11,996,262.
Claims priority of provisional application 62/989,464, filed on Mar. 13, 2020.
Claims priority of provisional application 62/978,188, filed on Feb. 18, 2020.
Prior Publication US 2024/0274400 A1, Aug. 15, 2024
Int. Cl. H01J 37/20 (2006.01); F16L 11/04 (2006.01); F16L 11/12 (2006.01); B01D 19/00 (2006.01); H01L 21/67 (2006.01)
CPC H01J 37/20 (2013.01) [F16L 11/04 (2013.01); F16L 11/12 (2013.01); B01D 19/0068 (2013.01); H01J 2237/2001 (2013.01); H01L 21/67288 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A system, comprising:
a stage configured to secure a wafer;
a chamber configured to house the stage and wherein the chamber is configured to operate in a vacuum environment;
a first tube provided within the chamber and configured to transfer fluid between the stage and outside of the chamber; and
a degasser system comprising:
a housing comprising a plurality of second tubes, wherein the housing is configured to receive the fluid, and
a vacuum system configured to remove gases from the fluid before the fluid enters the first tube.