US 12,249,446 B2
Variable resistor
Masami Watanabe, Chiba (JP)
Assigned to Fujikura Ltd., Tokyo (JP)
Appl. No. 17/792,945
Filed by Fujikura Ltd., Tokyo (JP)
PCT Filed Mar. 25, 2021, PCT No. PCT/JP2021/012693
§ 371(c)(1), (2) Date Jul. 14, 2022,
PCT Pub. No. WO2021/205899, PCT Pub. Date Oct. 14, 2021.
Claims priority of application No. 2020-071142 (JP), filed on Apr. 10, 2020.
Prior Publication US 2023/0050844 A1, Feb. 16, 2023
Int. Cl. H01C 10/44 (2006.01); H01C 1/022 (2006.01)
CPC H01C 10/44 (2013.01) [H01C 1/022 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A variable resistor, comprising:
a first substrate having a first main surface;
a resistor disposed on the first main surface;
a first wiring pattern disposed on the first main surface and connected to the resistor;
a spacer having an opening;
a second substrate that:
has second and third main surfaces, and
is disposed on the first substrate via the spacer such that the second main surface is opposed to the first main surface;
a connecting body that is:
disposed on the second main surface such that the connecting body is disposed in the opening, and
configured to electrically connect to the resistor by pushing of a pusher from the third main surface; and
a second wiring pattern that is either:
disposed on the first main surface and configured to be electrically connected to the connecting body by the pushing of the pusher; or
disposed on the second main surface and connected to the connecting body, wherein
in a plan view, the connecting body has a non-overlap region that does not overlap with the resistor,
in a plan view, a pushing region in which the pusher can push is included in the non-overlap region, and
a resistance value between the first wiring pattern and the second wiring pattern is changed based on a pushing position of the pusher,
in a plan view, the connecting body partially overlaps with the resistor,
in a plan view, the pushing region does not overlap with the resistor, and
the connecting body contacts the resistor by the pushing of the pusher from the third main surface.