US 12,248,253 B2
Optical device, exposure device, method for manufacturing flat panel display, and method for manufacturing device
Yasushi Mizuno, Saitama (JP); and Masaki Kato, Yokohama (JP)
Assigned to NIKON CORPORATION, Tokyo (JP)
Filed by NIKON CORPORATION, Tokyo (JP)
Filed on Dec. 29, 2023, as Appl. No. 18/400,139.
Application 18/400,139 is a continuation of application No. 17/859,140, filed on Jul. 7, 2022, granted, now 11,899,372.
Application 17/859,140 is a continuation of application No. PCT/JP2021/000578, filed on Jan. 8, 2021.
Prior Publication US 2024/0134288 A1, Apr. 25, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70191 (2013.01) 20 Claims
OG exemplary drawing
 
1. An optical device comprising:
a first spatial light modulator;
a second spatial light modulator;
an optical path switching machine into which pulse light including a plurality of pulses arranged at a time interval enters; and
a stage configured to move an exposure object in a first direction relative to the first spatial light modulator or the second spatial light modulator,
wherein the plurality of pulses includes a first pulse and a second pulse that are arranged at the time interval,
wherein the optical path switching machine is configured (i) to divide the pulse light into at least the first pulse and the second pulse, (ii) to guide the first pulse to a first optical path in which the first spatial light modulator is disposed, and (iii) to guide the second pulse to a second optical path in which the second spatial light modulator is disposed, so that the first pulse and the second pulse are guided to the respective first and second optical paths at different timings, and
wherein a moving speed of the stage is set based on an emission time of the first pulse or the second pulse.