US 12,247,890 B2
Vacuum gauge protector for deposition systems
David R. Beaulieu, Groton, MA (US); Jeffrey D. McHugh, Hudson, MA (US); and Andrew Lushington, Somerville, MA (US)
Assigned to Arradiance, LLC, Sudbury, MA (US)
Filed by Arradiance, LLC, Sudbury, MA (US)
Filed on Sep. 9, 2020, as Appl. No. 17/015,310.
Claims priority of provisional application 62/904,293, filed on Sep. 23, 2019.
Prior Publication US 2021/0088402 A1, Mar. 25, 2021
Int. Cl. G01L 19/06 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); G01L 21/00 (2006.01)
CPC G01L 19/0636 (2013.01) [C23C 16/4402 (2013.01); C23C 16/45544 (2013.01); G01L 19/0627 (2013.01); G01L 21/00 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A vacuum gauge protector for a vacuum gauge configured to couple to a port of a deposition system, the vacuum gauge protector comprising:
a) a body comprising an input port configured to couple to the vacuum gauge; and
b) a deposition material filter positioned in the body and comprising an inlet, at least three stacked disks, and an outlet, wherein the three stacked disks are configured to provide a plurality of non-linear paths to gases entering into the deposition material filter, wherein a first disk of the at least three stacked discs has only a single centered aperture, the first disc fluidly connected to a second disc of the at least three discs having a plurality of apertures adjacent to a disc circumference, wherein the third disc of the at least three stacked discs has only a single centered aperture, wherein the gases flow from the first disc to the second disc to the third disc to provide a path of resistance to limit gases comprising deposition material from reaching the vacuum gauge so as to reduce contamination of the vacuum gauge.