US 12,247,288 B2
Substrate processing apparatus and method
Väinö Kilpi, Masala (FI); and Tom Blomberg, Masala (FI)
Assigned to Picosun Oy, Espoo (FI)
Filed by Picosun Oy, Espoo (FI)
Filed on May 2, 2022, as Appl. No. 17/734,615.
Claims priority of application No. 20215556 (FI), filed on May 10, 2021.
Prior Publication US 2022/0356575 A1, Nov. 10, 2022
Int. Cl. C23C 16/458 (2006.01); C23C 16/455 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01)
CPC C23C 16/4583 (2013.01) [C23C 16/45544 (2013.01); H01L 21/67748 (2013.01); H01L 21/6875 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A substrate processing apparatus, comprising:
a reaction chamber having an upper portion and a lower portion sealing an inner volume of the reaction chamber for substrate processing, the lower portion being movable apart from the upper portion to form a substrate loading gap therebetween;
a substrate support system comprising a support table and at least one support element vertically movable in relation to the support table and extending through the support table to receive a substrate within the reaction chamber, the apparatus further comprising:
a stopper stopping a downward movement of the at least one support element at a substrate loading level, and
a stationary attachment part supporting the stopper,
wherein the upper portion and lower portion are configured to come into contact in order to seal the inner volume, and
wherein the lower portion comprises an exhaust line, wherein the stationary attachment part extends from the exhaust line.