US 11,923,227 B2
Electrostatic chuck and method for manufacturing same
Yasunori Kawanabe, Kirishima (JP); and Yoshihiro Okawa, Kirishima (JP)
Assigned to KYOCERA CORPORATION, Kyoto (JP)
Appl. No. 17/044,669
Filed by KYOCERA Corporation, Kyoto (JP)
PCT Filed Apr. 24, 2019, PCT No. PCT/JP2019/017408
§ 371(c)(1), (2) Date Oct. 1, 2020,
PCT Pub. No. WO2019/208625, PCT Pub. Date Oct. 31, 2019.
Claims priority of application No. 2018-086937 (JP), filed on Apr. 27, 2018.
Prior Publication US 2021/0104426 A1, Apr. 8, 2021
Int. Cl. H01L 21/683 (2006.01); H01L 21/67 (2006.01)
CPC H01L 21/6833 (2013.01) [H01L 21/67103 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An electrostatic chuck comprising:
an insulating base body comprising a predetermined surface; and
an electrode inside the base body, the electrode being layer shaped along the predetermined surface, wherein
an upper surface of the electrode and the base body are in contact, the upper surface facing a side where the predetermined surface is located, and
a gap which is rendered a vacuum or filled with a gas is interposed between a side surface of the electrode and the base body, wherein the gap comprises a portion with a size in a direction perpendicular to the predetermined surface larger than a size of the electrode in the direction perpendicular to the predetermined surface.