| CPC H01L 21/67051 (2013.01) [H01L 21/6715 (2013.01); H01L 21/68764 (2013.01)] | 20 Claims |
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1. A substrate processing apparatus, comprising:
a substrate support to support and rotate a substrate;
at least one first lower cleaning nozzle on the substrate support, the at least one first lower cleaning nozzle being configured to spray a first cleaning liquid having a first physical property onto a lower surface of the substrate;
at least one second lower cleaning nozzle on the substrate support, the at least one second lower cleaning nozzle being configured to spray a second cleaning liquid having a second physical property different from the first physical property onto the lower surface of the substrate;
a bowl assembly around the substrate support, the bowl assembly including:
an annular shaped receiving space surrounding the substrate support, the annular shaped receiving space to accommodate a chemical solution scattered from the substrate, and
an inner collection portion and an outer collection portion sequentially arranged in a radial direction in a lower portion of the annular shaped receiving space;
a discharge guide plate having an annular shape, the discharge guide plate being in the receiving space of the bowl assembly under the substrate, and the discharge guide plate extending outwardly from a circumference of the substrate; and
a discharge separation plate within the receiving space of the bowl assembly, the discharge separation plate being movable upward and downward relative to the discharge guide plate, respectively,
wherein the discharge guide plate includes:
an upwardly inclined plate extending from an upper portion of the inner sidewall away from the substrate support,
a top portion extending from the upwardly inclined plate,
a downwardly inclined plate extending from the top portion away from the substrate support, and
partition walls extending along an upper surface of the downwardly inclined plate, each of the partition walls extending from the top portion to a bottom edge of the downwardly inclined plate at an oblique angle with respect to the bottom edge,
wherein, when the discharge separation plate is in a lowered position, the discharge separation plate and the discharge guide plate together define a first discharge path through which the first cleaning liquid scattered from the substrate is collected in the outer collection portion, and
wherein, when the discharge separation plate is in a raised position, the discharge separation plate and the discharge guide plate together define a second discharge path through which the second cleaning liquid scattered from the substrate is collected in the inner collection portion.
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