US 11,921,434 B2
Mask cleaning
Shu-Hao Chang, Taipei (TW); Norman Chen, Hsinchu (TW); Jeng-Horng Chen, Hsinchu (TW); Kuo-Chang Kau, Yuanli Township (TW); Ming-Chin Chien, Hsinchu (TW); Shang-Chieh Chien, New Taipei (TW); Anthony Yen, Hsinchu (TW); and Kevin Huang, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu (TW)
Filed on Dec. 15, 2022, as Appl. No. 18/066,411.
Application 18/066,411 is a continuation of application No. 17/677,183, filed on Feb. 22, 2022, granted, now 11,740,563.
Application 17/677,183 is a continuation of application No. 16/660,640, filed on Oct. 22, 2019, granted, now 11,256,179, issued on Feb. 22, 2022.
Application 16/660,640 is a continuation of application No. 14/840,581, filed on Aug. 31, 2015, granted, now 10,459,352, issued on Oct. 29, 2019.
Prior Publication US 2023/0124211 A1, Apr. 20, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70866 (2013.01) [G03F 7/70925 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus, comprising:
a vacuum chamber;
a reflective optical element arranged in the vacuum chamber, wherein the reflective optical element is configured to reflect an extreme ultra-violet (EUV) light; and
a cleaning module positioned in the vacuum chamber, wherein the cleaning module is operable to:
provide a mitigation gas flowing towards the reflective optical element, wherein the mitigation gas mitigates, by chemical reaction, contamination of the reflective optical element; and
provide a hydrogen-containing gas flowing towards the reflective optical element.