US 11,919,327 B2
Transfer-type decorative sheet and method of manufacturing transfer-type decorative sheet
Hideki Kaneiwa, Minamiashigara (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Sep. 28, 2021, as Appl. No. 17/487,520.
Application 17/487,520 is a continuation of application No. PCT/JP2020/012089, filed on Mar. 18, 2020.
Claims priority of application No. 2019-067784 (JP), filed on Mar. 29, 2019.
Prior Publication US 2022/0009275 A1, Jan. 13, 2022
Int. Cl. B44C 1/165 (2006.01); B32B 7/06 (2019.01); B44C 1/17 (2006.01); C09K 19/04 (2006.01); G02B 5/30 (2006.01); G02F 1/1335 (2006.01)
CPC B44C 1/165 (2013.01) [B32B 7/06 (2013.01); B44C 1/1741 (2013.01); C09K 19/04 (2013.01); G02B 5/3016 (2013.01); G02F 1/133543 (2021.01); C09K 2323/00 (2020.08); C09K 2323/02 (2020.08); C09K 2323/03 (2020.08)] 8 Claims
OG exemplary drawing
 
1. A transfer-type decorative sheet comprising:
a temporary support;
an underlayer that is peelable from and disposed on one surface of the temporary support; and
a decorative layer that is disposed on the underlayer,
wherein the decorative layer includes at least one cholesteric liquid crystal layer,
the underlayer is a layer that is formed of a composition including a monomer having one or two polymerizable groups,
a water contact angle of the underlayer is 50° or more,
the monomer having one or two polymerizable groups has a cyclic structure,
a maximum reflectivity of an integral reflection spectrum in a wavelength range of 380 to 780 nm of the decorative layer is 50% or higher,
a specular reflectivity at a wavelength at which the decorative layer has the maximum reflectivity is 20% or lower, and
a half-width of an integral reflection spectrum of the decorative layer is 80 to 250 nm.