US 11,919,031 B2
Coating device and wiping method
Naoki Kobayashi, Kirishima (JP); Daisuke Hozumi, Kirishima (JP); Ryota Nagaike, Kirishima (JP); and Nobuaki Yamakuchi, Kirishima (JP)
Assigned to KYOCERA CORPORATION, Kyoto (JP)
Appl. No. 17/755,317
Filed by KYOCERA CORPORATION, Kyoto (JP)
PCT Filed Oct. 28, 2020, PCT No. PCT/JP2020/040510
§ 371(c)(1), (2) Date Apr. 26, 2022,
PCT Pub. No. WO2021/085501, PCT Pub. Date May 6, 2021.
Claims priority of application No. 2019-195271 (JP), filed on Oct. 28, 2019.
Prior Publication US 2022/0379338 A1, Dec. 1, 2022
Int. Cl. B05C 11/00 (2006.01); B05C 5/02 (2006.01); B08B 1/00 (2006.01); B08B 1/02 (2006.01); B08B 13/00 (2006.01); B25J 11/00 (2006.01); B41J 2/165 (2006.01)
CPC B05C 11/00 (2013.01) [B05C 5/02 (2013.01); B08B 1/006 (2013.01); B08B 1/02 (2013.01); B08B 13/00 (2013.01); B25J 11/0075 (2013.01); B41J 2/16535 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A coating device, comprising:
a head comprising a nozzle surface configured to discharge a coating material;
a wiping mechanism configured to wipe the nozzle surface;
an articulated arm configured to hold the head; and
a controller configured to control movement of the head via the articulated arm, wherein
the controller is configured to:
relatively move the head with respect to the wiping mechanism to wipe the nozzle surface, and
cause the articulated arm to be temporarily stationary before an operation of wiping the nozzle surface,
the controller is configured to
move the head in a posture in which the nozzle surface is inclined with respect to the wiping mechanism, and
move the head while changing an inclination of the nozzle surface with respect to the wiping mechanism.