US 12,245,439 B2
Metal-insulator-metal (MIM) capacitor including an insulator cup and laterally-extending insulator flange
Yaojian Leng, Vancouver, WA (US)
Assigned to Microchip Technology Incorporated, Chandler, AZ (US)
Filed by Microchip Technology Incorporated, Chandler, AZ (US)
Filed on May 16, 2022, as Appl. No. 17/744,881.
Claims priority of provisional application 63/293,876, filed on Dec. 27, 2021.
Prior Publication US 2023/0207614 A1, Jun. 29, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 49/02 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H10D 1/00 (2025.01); H10D 1/68 (2025.01)
CPC H10D 1/042 (2025.01) [H01L 21/76877 (2013.01); H01L 21/76883 (2013.01); H01L 23/5223 (2013.01); H01L 23/5226 (2013.01); H10D 1/043 (2025.01); H10D 1/692 (2025.01); H10D 1/714 (2025.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
forming a tub opening in a dielectric region;
depositing a conformal metal layer over the dielectric region and extending down into the tub opening, the deposited conformal metal forming (a) a cup-shaped conformal metal layer region in the tub opening and (b) a lateral conformal metal layer region extending laterally outwardly from a top of the cup-shaped conformal metal region;
removing a corner region of the conformal metal layer at a corner defined between the cup-shaped conformal metal layer region and the lateral conformal metal layer region by a process including:
forming an oxide layer having an opening over the corner region of the conformal metal layer; and
etching through the opening in the oxide layer to remove the corner region of the conformal metal layer;
wherein a remaining portion of the cup-shaped conformal metal layer region defines a bottom electrode cup including (a) a laterally-extending bottom electrode cup base and (b) a bottom electrode cup sidewall extending upwardly from the laterally-extending bottom electrode cup base;
depositing an insulator layer including (a) an insulator cup in an opening defined by the bottom electrode cup and (b) an insulator flange extending laterally outwardly from the insulator cup and extending laterally over an upper surface of the bottom electrode cup sidewall;
depositing a top electrode layer over the insulator layer and extending into an opening defined by the insulator cup, wherein the top electrode layer includes a top electrode cap region extending over the insulator flange, wherein the insulator flange is arranged between the top electrode cap region and the upper surface of the bottom electrode cup sidewall;
removing upper portions of the top electrode layer, insulator layer, and conformal metal layer, wherein (a) a remaining portion of the top electrode layer defines a top electrode, and (b) a remaining portion of the insulator layer defines an insulator including the insulator cup and the insulator flange; and
forming a top electrode connection pad conductively connected to the top electrode;
wherein the top electrode is insulated from the upper surface of the bottom electrode cup sidewall by the insulator flange.