US 12,245,352 B2
Plasma generator
Vladimir Leonov, Moscow (RU); Sergei Altunin, Bryansk (RU); Oleg Kulakovskii, Saint Petersburg (RU); Haslen Matthew Back, London (GB); and Valeria Tyutina, London (GB)
Assigned to Ananda Shakti Technologies Ltd., Nicosia (CY)
Appl. No. 17/782,968
Filed by Ananda Shakti Technologies Ltd., Nicosia (CY)
PCT Filed Dec. 3, 2020, PCT No. PCT/EP2020/084425
§ 371(c)(1), (2) Date Jun. 6, 2022,
PCT Pub. No. WO2021/110812, PCT Pub. Date Jun. 10, 2021.
Claims priority of application No. 1917736 (GB), filed on Dec. 4, 2019.
Prior Publication US 2023/0017324 A1, Jan. 19, 2023
Int. Cl. H05H 1/24 (2006.01); C02F 1/46 (2023.01); C02F 103/08 (2006.01); F24H 1/00 (2022.01); H05H 1/46 (2006.01)
CPC H05H 1/247 (2021.05) [C02F 1/4608 (2013.01); F24H 1/0018 (2013.01); H05H 1/466 (2021.05); C02F 2103/08 (2013.01); F24H 2250/10 (2013.01); H05H 2245/20 (2021.05)] 39 Claims
OG exemplary drawing
 
1. A plasma generator comprising a cathode, an anode and a stabilizing electrode, wherein the stabilizing electrode stabilizes a region of plasma within a fluid, wherein a high voltage direct current power supply is coupled to the cathode and the anode, and wherein a decoupling inductor is interposed between the high voltage direct current power supply and the cathode.
 
37. A method for plasma generation within a fluid, the method comprising:
contacting a cathode and an anode to the fluid;
forming a region of plasma in the fluid;
stabilizing the region of plasma using a stabilizing electrode;
coupling a high voltage direct current power supply to the cathode and the anode; and
interposing a decoupling inductor between the high voltage direct current power supply and the cathode.