US 12,243,761 B2
Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
Martin Jeffrey Salinas, San Jose, CA (US); Zhepeng Cong, San Jose, CA (US); Hui Chen, Tempe, AZ (US); Xinning Luan, Tempe, AZ (US); and Ashur J. Atanos, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 27, 2022, as Appl. No. 18/050,384.
Prior Publication US 2024/0145281 A1, May 2, 2024
Int. Cl. H01L 21/67 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/67294 (2013.01) [H01L 21/67259 (2013.01); H01L 21/68785 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A substrate support, comprising:
a top surface configured to receive a substrate in a process chamber, the top surface of the substrate support comprising a rim bordering a pocket, the pocket configured to receive the substrate; and
a marking feature disposed on the rim of the substrate support, the marking feature configured to be detectable by an imaging apparatus coupled to the process chamber to provide information related to the substrate support via imaging when the substrate support is disposed within the process chamber.