US 12,243,760 B2
Substrate processing apparatus
Jihyun Seo, Suwon-si (KR)
Assigned to BEILab corp., Ansan-si (KR)
Filed by BEILab corp., Ansan-si (KR)
Filed on Jan. 5, 2022, as Appl. No. 17/569,009.
Claims priority of application No. 10-2021-0005380 (KR), filed on Jan. 14, 2021.
Prior Publication US 2022/0223439 A1, Jul. 14, 2022
Int. Cl. H01L 21/67 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/67201 (2013.01) [H01L 21/67126 (2013.01); H01L 21/68764 (2013.01); H01L 21/68792 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a load lock chamber configured to accommodate a substrate and be sealed in a vacuum state;
a reaction chamber configured to accommodate the load lock chamber; and
a shaft extending toward the load lock chamber accommodated in the reaction chamber and configured to open or close the load lock chamber,
wherein the shaft has a first coupling portion formed at one end thereof,
wherein the load lock chamber comprises first and second casings configured to be coupled to or separated from each other by rotating, the second casing including a second coupling portion,
wherein the first coupling portion of the shaft is coupled to the second coupling portion of the second casing by rotating in a first direction, and
wherein the second casing is coupled to the first casing by rotating in a second direction opposite to the first direction.