US 12,243,720 B2
Gas supply block and substrate-processing apparatus including the same
Byoung Ho Song, Suwon-si (KR)
Assigned to WONIK IPS CO., LTD, Pyeongtaek-si (KR)
Filed by WONIK IPS CO., LTD., Pyeongtaek-si (KR)
Filed on Nov. 2, 2021, as Appl. No. 17/517,068.
Claims priority of application No. 10-2020-0158741 (KR), filed on Nov. 24, 2020.
Prior Publication US 2022/0165548 A1, May 26, 2022
Int. Cl. H01J 37/32 (2006.01); C23C 16/455 (2006.01)
CPC H01J 37/32449 (2013.01) [C23C 16/455 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01)] 27 Claims
OG exemplary drawing
 
1. A gas supply block comprising:
a lower block including a plurality of first gas supply passages configured to distribute and supply a first process gas into a plurality of processing spaces and a first gas inlet passage configured to introduce the first process gas into the plurality of first gas supply passages;
wherein the lower block comprises a first block and a second block, the first gas inlet passage is formed in the first block, a first partition extends from the first block, an inner space of the first partition is open to the first gas inlet passage and a first inserting groove within the second block, and the first process gas in the inner space of the first partition diffuses through a gap between the first partition and a surface of the second block;
an upper block including a plurality of second gas supply passages configured to distribute and supply a second process gas different from the first process gas into the plurality of processing spaces and a second gas inlet passage configured to supply the second process gas into the plurality of second gas supply passages; and
wherein the upper block comprises a third block and a fourth block, the second gas inlet passage is formed in the third block, a second partition extends from the third block, an inner space of the second partition is open to the second gas inlet passage and a second inserting groove within the fourth block, and the second process gas in the inner space of the second partition diffuses through a gap between the second partition and a surface of the fourth block.