US 12,243,712 B2
Method and system for determining a charged particle beam exposure for a local pattern density
Akira Fujimura, Saratoga, CA (US); Harold Robert Zable, Palo Alto, CA (US); Nagesh Shirali, San Jose, CA (US); Abhishek Shendre, Fremont, CA (US); William E. Guthrie, Santa Clara, CA (US); and Ryan Pearman, San Jose, CA (US)
Assigned to D2S, Inc., San Jose, CA (US)
Filed by D2S, Inc., San Jose, CA (US)
Filed on Aug. 3, 2023, as Appl. No. 18/365,146.
Application 18/365,146 is a continuation of application No. 18/068,293, filed on Dec. 19, 2022.
Application 18/068,293 is a continuation in part of application No. 17/304,307, filed on Jun. 17, 2021, granted, now 11,756,765.
Application 17/304,307 is a continuation in part of application No. 16/934,281, filed on Jul. 21, 2020, granted, now 11,062,878, issued on Jul. 13, 2021.
Application 16/934,281 is a continuation of application No. 16/422,269, filed on May 24, 2019, granted, now 10,748,744, issued on Aug. 18, 2020.
Prior Publication US 2023/0386784 A1, Nov. 30, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/302 (2006.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01); G03F 7/20 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/3026 (2013.01) [G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 7/2061 (2013.01); H01J 37/3177 (2013.01); H01J 2237/31761 (2013.01); H01J 2237/31771 (2013.01); H01J 2237/31774 (2013.01); H01J 2237/31776 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A system for exposing a pattern in an area on a surface using a charged particle beam system, the system comprising:
a computer processor configured to determine a local pattern density for the area, based on an original set of exposure information;
a computer processor configured to determine a pre-proximity effect correction (PEC) maximum dose for the local pattern density, based on a pre-determined target post-PEC maximum dose; and
a computer processor configured to modify the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.