US 12,243,709 B2
Apparatus using multiple charged particle beams
Weiming Ren, San Jose, CA (US); Xuedong Liu, San Jose, CA (US); Xuerang Hu, San Jose, CA (US); and Zhong-Wei Chen, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jul. 12, 2021, as Appl. No. 17/373,766.
Application 17/373,766 is a division of application No. 16/474,027, granted, now 11,062,874, previously published as PCT/EP2017/084429, filed on Dec. 22, 2017.
Claims priority of provisional application 62/440,493, filed on Dec. 30, 2016.
Prior Publication US 2022/0005665 A1, Jan. 6, 2022
Int. Cl. H01J 37/145 (2006.01)
CPC H01J 37/145 (2013.01) [H01J 2237/21 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An anti-rotation lens having a focusing power for focusing a charged particle beam, comprising:
a magnetic lens configured to generate a magnetic field being aligned with an optical axis of the anti-rotation lens; and
an electrostatic lens configured to generate an electrostatic field being aligned with the optical axis, wherein the magnetic field and the electrostatic field at least partially overlap, and the focusing power of the anti-rotation lens is adjustable by varying the magnetic field and/or the electrostatic field.