US 12,243,708 B2
Ion generator and ion implanter
Syuta Ochi, Ehime (JP)
Assigned to SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD., Tokyo (JP)
Filed by SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD., Tokyo (JP)
Filed on Nov. 9, 2023, as Appl. No. 18/505,522.
Application 18/505,522 is a continuation of application No. 17/836,109, filed on Jun. 9, 2022, granted, now 11,848,170.
Application 17/836,109 is a continuation of application No. 16/818,675, filed on Mar. 13, 2020, granted, now 11,380,512, issued on Jul. 5, 2022.
Claims priority of application No. 2019-049842 (JP), filed on Mar. 18, 2019.
Prior Publication US 2024/0079199 A1, Mar. 7, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/08 (2006.01); H01J 37/063 (2006.01); H01J 37/317 (2006.01); H01J 37/32 (2006.01)
CPC H01J 37/08 (2013.01) [H01J 37/063 (2013.01); H01J 37/3171 (2013.01); H01J 37/32385 (2013.01); H01J 37/32788 (2013.01); H01J 2237/082 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An ion implanter comprising:
a beam generation unit that comprises an ion generator to generate ions, and that generates an ion beam of the ions extracted from the ion generator; and
a substrate processing unit in which the ion beam is implanted into a substrate, wherein
the ion generator includes an arc chamber which defines a plasma generation space,
the arc chamber includes a box-shaped main body which includes an opening in at least a part of a front side of the main body, and a slit member which is mounted to cover the opening of the front side of the main body and provided with a front slit for extracting ions,
an inner surface of the main body which is exposed to the plasma generation space is made of a first refractory metal material, and
an inner surface of the slit member which is exposed to the plasma generation space is made of graphite.