US 12,242,203 B2
Target for measuring a parameter of a lithographic process
Maurits Van Der Schaar, Eindhoven (NL); Patrick Warnaar, Tilburg (NL); Franciscus Godefridus Casper Bijnen, Valkenswaard (NL); and Olger Victor Zwier, Eindhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/001,255
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Jun. 8, 2021, PCT No. PCT/EP2021/065351
§ 371(c)(1), (2) Date Dec. 8, 2022,
PCT Pub. No. WO2021/250034, PCT Pub. Date Dec. 16, 2021.
Claims priority of provisional application 63/036,671, filed on Jun. 9, 2020.
Prior Publication US 2023/0236515 A1, Jul. 27, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70683 (2013.01) [G03F 7/70633 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A target arrangement comprising:
left and right regions and a first target region in a middle of the left and right regions, the first target region comprising at least first and second portions comprising respective first and second pitches; and
a second target region comprising at least a third pitch;
wherein the second portion overlaps with a portion of the second target region.