US 12,242,193 B2
Coating compositions for use with an overcoated photoresist
Eui-Hyun Ryu, Cheonan (KR); Jin Hong Park, Hwaseong (KR); You Rim Shin, Hwaseong (KR); Ji-Hon Kang, Hwaseong (KR); Jung-June Lee, Cheonan (KR); and Jae-Bong Lim, Cheonan (KR)
Assigned to ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., Ghungcheongnam-Do (KR)
Filed by Rohm and Haas Electronic Materials Korea Ltd., Cheonan (KR)
Filed on Sep. 11, 2023, as Appl. No. 18/464,695.
Application 18/464,695 is a division of application No. 15/337,558, filed on Oct. 28, 2016, granted, now 11,822,248.
Claims priority of provisional application 62/249,197, filed on Oct. 31, 2015.
Prior Publication US 2023/0418161 A1, Dec. 28, 2023
Int. Cl. G03F 7/11 (2006.01); C08G 63/685 (2006.01); C08G 73/06 (2006.01); C09D 5/00 (2006.01); C09D 179/04 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01)
CPC G03F 7/091 (2013.01) [C08G 63/6854 (2013.01); C08G 73/0644 (2013.01); C09D 5/006 (2013.01); C09D 179/04 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01)] 20 Claims
 
1. A coated substrate comprising:
a substrate having thereon:
a) a coating composition comprising:
a resin that comprises one or more glycoluril groups that have a non-hydrogen substituent at the 1 and/or 5 glycoluril ring positions, wherein the resin comprises 1) polyester linkages and/or 2) polymerized isocyanurate groups, wherein the one or more glycoluril groups are pendant glycoluril groups covalently linked to the resin; and
b) a layer of a photoresist composition above the coating composition layer.
 
11. A resin that comprises one or more glycoluril groups that have a non-hydrogen substituent at the 1 and/or 5 glycoluril ring positions, wherein the resin comprises 1) polyester linkages and/or 2) polymerized isocyanurate groups, wherein the one or more glycoluril groups are pendant glycoluril groups covalently linked to the resin.