US 12,242,190 B2
Photoacid generator for chemically amplified photoresists
Gerhard Ingmar Meijer, Zurich (CH); Valery Weber, Gattikon (CH); and Peter Willem Jan Staar, Zurich (CH)
Assigned to International Business Machines Corporation, Armonk, NY (US)
Filed by International Business Machines Corporation, Armonk, NY (US)
Filed on Mar. 29, 2021, as Appl. No. 17/215,363.
Prior Publication US 2022/0308448 A1, Sep. 29, 2022
Int. Cl. G03F 7/004 (2006.01); C07C 309/29 (2006.01); C07C 381/12 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 309/29 (2013.01); C07C 381/12 (2013.01); G03F 7/2004 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A photoacid generator comprising a cation and a polycyclic aromatic photoacid generator compound anion of a general formula, wherein the general formula comprises (first benzene moiety-X-second benzene moiety)−, and wherein the cation is selected from the group consisting of triphenylsulfonium, diphenyliodonium, phenylthiolanium, and derivatives thereof and wherein:
X represents a central cycle;
the first benzene moiety is substituted with a first sulfonate group and the second benzene moiety is substituted with a second sulfonate group; or
the first benzene moiety is substituted with a sulfonate group and the second benzene moiety is substituted with a sulfonic acid group; and
the first sulfonate group and the second sulfonate group or the first sulfonate group and the sulfonic acid group are arranged on said first and second benzene moiety such that their orbitals can interact with each other.