	US 12,242,182 B2
	Method for removing particles from pellicle and photomask
Tzu Han Liu, Tainan (TW); Chih-Wei Wen, Tainan (TW); and Chung-Hung Lin, Tainan (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu (TW)
Filed on Oct. 10, 2023, as Appl. No. 18/484,432.
Application 18/484,432 is a continuation of application No. 17/373,695, filed on Jul. 12, 2021, granted, now 11,822,231.
Claims priority of provisional application 63/167,871, filed on Mar. 30, 2021.
Prior Publication US 2024/0036463 A1, Feb. 1, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 1/64 (2012.01); G03F 7/00 (2006.01)

CPC G03F 1/64 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70983 (2013.01)]

20 Claims

1. A method for removing particles, comprising:

receiving a pellicle including a pellicle membrane, wherein a particle is disposed on the pellicle membrane;

passing a light beam through an object lens, wherein the light beam is focused on a focal region in front of the pellicle membrane by the object lens, and the particle is attracted to be trapped at the focal region; and

removing the particle from the pellicle membrane at the focal region.