US 12,242,151 B2
Display panel and manufacturing method thereof and display device
Hailong Wen, Guangdong (CN); and Yuxiu Zhang, Guangdong (CN)
Assigned to Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., LTD., Guangzhou (CN)
Appl. No. 17/780,156
Filed by Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., LTD., Guangdong (CN)
PCT Filed May 20, 2022, PCT No. PCT/CN2022/094186
§ 371(c)(1), (2) Date Nov. 2, 2023,
PCT Pub. No. WO2023/206667, PCT Pub. Date Nov. 2, 2023.
Claims priority of application No. 202210456521.2 (CN), filed on Apr. 27, 2022.
Prior Publication US 2024/0184160 A1, Jun. 6, 2024
Int. Cl. G02F 1/1335 (2006.01); G02F 1/1339 (2006.01)
CPC G02F 1/133516 (2013.01) [G02F 1/133512 (2013.01); G02F 1/13394 (2013.01); G02F 1/13396 (2021.01)] 4 Claims
OG exemplary drawing
 
1. A manufacturing method of a display panel, comprising:
providing a substrate layer;
manufacturing a black matrix on the substrate layer and forming an opening in the black matrix;
forming a first color resist layer filled in the opening and covering the black matrix;
forming a second color resist layer corresponding to the black matrix on the first color resist layer; and
forming a spacer on a position of the second color resist layer corresponding to the black matrix, and forming a protective layer corresponding to the opening on the first color resist layer simultaneously;
wherein when forming spacer on the second color resist layer, a step of forming the protective layer corresponding to the opening on the first color resist layer simultaneously comprises the following steps:
forming a transparent photocurable material layer on the first color resist layer and the second color resist layer;
providing a halftone mask, wherein the halftone mask is provided with a first light-transmitting hole, a second light-transmitting hole, and a third light-transmitting hole, the first light-transmitting hole and the second light-transmitting hole correspond to the black matrix, the third light-transmitting hole corresponds to the opening, and a light transmittance of the first light-transmitting hole is less than a light transmittance of the second light-transmitting hole and a light transmittance of the third light-transmitting hole; and
patterning the photocurable material layer through the halftone mask, forming a main support column at a position on the photocurable material layer corresponding to the first light-transmitting hole, forming an auxiliary support column at a position on the photocurable material layer corresponding to the second light-transmitting hole, and forming the protective layer at a position on the photocurable material layer corresponding to the third light-transmitting hole.