US 12,241,696 B2
Electrohydrodynamics system and method
Mikael Antelius, Täby (SE); Henrik Löfgren, Uppsala (SE); Are Björneklett, Västerås (SE); Peter Nilsson, Sundbyberg (SE); and Robert Thorslund, Sigtuna (SE)
Assigned to APR Technologies AB, (SE)
Appl. No. 17/774,825
Filed by APR Technologies AB, Enköping (SE)
PCT Filed Nov. 6, 2020, PCT No. PCT/EP2020/081239
§ 371(c)(1), (2) Date May 5, 2022,
PCT Pub. No. WO2021/089757, PCT Pub. Date May 14, 2021.
Claims priority of application No. 1951280-5 (SE), filed on Nov. 8, 2019.
Prior Publication US 2022/0390190 A1, Dec. 8, 2022
Int. Cl. G21K 5/00 (2006.01); F04B 17/00 (2006.01); F04B 19/04 (2006.01); F28F 13/16 (2006.01)
CPC F28F 13/16 (2013.01) [F04B 17/00 (2013.01); F04B 19/04 (2013.01); G21K 5/00 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method for use in an electrohydrodynamic (EHD) thermal management system, the method comprising:
exposing a dielectric fluid to an ionizing irradiation from a radiating source, thereby ionizing the dielectric fluid; and
operating at least one EHD pump unit comprising at least two electrodes for pumping the dielectric fluid to circulate the exposed fluid in an enclosure for accommodating the dielectric fluid within the system;
wherein the radiating source is arranged separately from the at least one EHD pump unit; and
wherein the dielectric fluid is exposed to the ionizing irradiation from the radiating source in at least one of:
a part of said enclosure, wherein a wall portion of the enclosure is exposed to said ionizing irradiation;
a location separated from said EHD thermal management system, from which location the dielectric fluid is added to said EHD thermal management system after exposure; or
within said enclosure, wherein the dielectric fluid is exposed to the ionizing irradiation by a substance located within said enclosure.