US 12,241,159 B2
Substrate processing apparatus and ceiling heater
Tetsuya Kosugi, Toyama (JP); Hitoshi Murata, Toyama (JP); and Shuhei Saido, Toyama (JP)
Assigned to Kokusai Electric Corporation, Tokyo (JP)
Filed by KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed on May 31, 2019, as Appl. No. 16/427,395.
Application 16/427,395 is a continuation of application No. PCT/JP2017/034052, filed on Sep. 21, 2017.
Claims priority of application No. 2016-234166 (JP), filed on Dec. 1, 2016.
Prior Publication US 2019/0284696 A1, Sep. 19, 2019
Int. Cl. C23C 16/46 (2006.01); C23C 16/52 (2006.01); H01L 21/31 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01)
CPC C23C 16/46 (2013.01) [C23C 16/52 (2013.01); H01L 21/31 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01); H01L 21/67303 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a reaction tube accommodating therein a plurality of substrates vertically arranged; and
a first heater configured to heat an inside of the reaction tube from an upper portion of the reaction tube with a heat generating element divided into two portions comprising a central portion and an outer peripheral portion in a manner that the central portion and the outer peripheral portion are heated individually by adjusting a heating amount of each of the central portion and the outer peripheral portion, and
wherein end portions of the outer peripheral portion are not adjacent to outermost turnaround portions of the heat generating element, and turnaround portions of the heat generating element are not adjacent to the end portions in a direction outward from a center of the heat generating element in the outer peripheral portion of the heat generating element.