| CPC C01B 32/162 (2017.08) [B32B 3/10 (2013.01); C01B 32/158 (2017.08); C23C 16/0209 (2013.01); C23C 16/0227 (2013.01); C23C 16/0281 (2013.01); C23C 16/26 (2013.01); Y10T 428/24802 (2015.01)] | 18 Claims |

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14. A method, comprising:
forming patterned features on a surface of a substrate by depositing material, patterning the material, and etching the material to form the patterned features;
disposing a polymeric material comprising a block copolymer onto a surface of a substrate between the patterned features;
annealing the polymeric material to form aligned phases of the polymeric material between the patterned features;
removing portions of the polymeric material to form exposed substrate sections on the surface of the substrate corresponding to the aligned phases;
selectively forming catalyst material only on the exposed substrate sections by selectively decomposing one or more metal-containing precursors including the catalyst material on the exposed substrate surface sections, compared to the patterned polymeric material and exposing the catalyst material to a reducing environment;
forming nanoparticles comprising the catalyst material;
providing a carbon-containing compound to a reaction space; and
decomposing the carbon-containing compound on the catalyst material to form one or more carbon nanotubes,
wherein the one or more carbon nanotubes form a channel between a source and a drain of a device; and
wherein the method further comprising, after forming the nanoparticles, performing an oxidation step followed by a reducing step.
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