US 12,240,754 B2
Liquid for nitriding treatment, nitrided metal oxide manufacturing method, and nitrided indium oxide film
Kiyoharu Tadanaga, Sapporo (JP); Akira Miura, Sapporo (JP); Tadayuki Isaji, Funabashi (JP); and Shinichi Maeda, Funabashi (JP)
Assigned to NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, Sapporo (JP); and NISSAN CHEMICAL CORPORATION, Sapporo (JP)
Appl. No. 17/266,188
Filed by NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, Sapporo (JP); and NISSAN CHEMICAL CORPORATION, Tokyo (JP)
PCT Filed Aug. 20, 2019, PCT No. PCT/JP2019/032484
§ 371(c)(1), (2) Date Feb. 5, 2021,
PCT Pub. No. WO2020/040149, PCT Pub. Date Feb. 27, 2020.
Claims priority of application No. 2018-155818 (JP), filed on Aug. 22, 2018.
Prior Publication US 2021/0292168 A1, Sep. 23, 2021
Int. Cl. C01B 21/082 (2006.01); C07D 229/00 (2006.01)
CPC C01B 21/0821 (2013.01) [C07D 229/00 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A nitriding treatment liquid consisting of an alkali metal amide dissolved in a solvent,
wherein the alkali metal amide is lithium amide, sodium amide, potassium amide, or a mixture thereof, and
wherein the solvent comprises a cyclic alkylene urea represented by the following formula (1):

OG Complex Work Unit Chemistry
 wherein each of R1 and R2 represents a C1 to C3 alkyl group, and R3 represents a C1 to C4 alkylene group.