US 11,916,088 B2
Semiconductor device, and module and electronic appliance including the same
Hiroyuki Miyake, Kanagawa (JP)
Assigned to Semiconductor Energy Laboratory Co., Ltd., (JP)
Filed by Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken (JP)
Filed on Mar. 9, 2023, as Appl. No. 18/119,490.
Application 18/119,490 is a continuation of application No. 16/683,871, filed on Nov. 14, 2019, granted, now 11,605,655.
Application 16/683,871 is a continuation of application No. 14/628,657, filed on Feb. 23, 2015, granted, now 10,483,293, issued on Nov. 19, 2019.
Claims priority of application No. 2014-037156 (JP), filed on Feb. 27, 2014.
Prior Publication US 2023/0215879 A1, Jul. 6, 2023
Int. Cl. H01L 27/12 (2006.01); G09G 3/3233 (2016.01); G09G 3/3266 (2016.01); G09G 3/3291 (2016.01); H01L 29/786 (2006.01); H01L 33/38 (2010.01); H01L 33/62 (2010.01)
CPC H01L 27/1255 (2013.01) [G09G 3/3233 (2013.01); G09G 3/3266 (2013.01); G09G 3/3291 (2013.01); H01L 27/1225 (2013.01); H01L 27/124 (2013.01); H01L 27/1251 (2013.01); H01L 29/78648 (2013.01); H01L 33/382 (2013.01); H01L 33/62 (2013.01); G09G 2300/0819 (2013.01); G09G 2300/0842 (2013.01); G09G 2300/0861 (2013.01); G09G 2310/0248 (2013.01); G09G 2310/0286 (2013.01); G09G 2310/0297 (2013.01)] 2 Claims
OG exemplary drawing
 
1. A semiconductor device comprising a pixel,
the pixel comprising:
a first transistor;
a second transistor; and
a capacitor,
the first transistor comprising:
a first gate electrode;
a first insulating film which is positioned over the first gate electrode and which functions as a gate insulating film;
a first oxide semiconductor film which is positioned over the first insulating film and which has a channel region;
a first conductive film having a region in contact with a top surface of the first oxide semiconductor film; and
a second conductive film having a region in contact with the top surface of the first oxide semiconductor film,
wherein a second insulating film comprises a region in contact with the top surface of the first oxide semiconductor film, a region in contact with a top surface of the first conductive film, and a region in contact with a top surface of the second conductive film,
wherein a third insulating film is positioned over the second insulating film;
wherein a second electrode is positioned over the third insulating film and electrically connected to the first conductive film and functions as a pixel electrode;
wherein a light-emitting layer is positioned over the second electrode,
the second transistor comprising:
a second gate electrode;
the first insulating film; and
a second oxide semiconductor film which is positioned over the first insulating film and which has a channel region,
wherein the second insulating film comprises a region in contact with a top surface of the second oxide semiconductor film,
the capacitor comprising:
a first electrode;
the first insulating film positioned over the first electrode;
the second insulating film positioned over the first insulating film;
the third insulating film positioned over the second insulating film; and
a third electrode positioned over the third insulating film,
the first electrode comprising:
a region overlapping with the first insulating film;
a region overlapping with the second insulating film;
a region overlapping with the third insulating film;
a region overlapping with the first conductive film;
a region overlapping with the second electrode; and
a region overlapping with the third electrode,
wherein the first electrode is provided over the same layer as the first gate electrode with the same material, and
wherein the first electrode is electrically connected to the first conductive film.