US 11,914,307 B2
Inspection apparatus lithographic apparatus measurement method
Bas Johannes Petrus Roset, Eindhoven (NL); Johannes Hendrik Everhardus Aldegonda Muijderman, Veldhoven (NL); and Benjamin Cunnegonda Henricus Smeets, Weert (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/433,897
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Jan. 28, 2020, PCT No. PCT/EP2020/051998
§ 371(c)(1), (2) Date Aug. 25, 2021,
PCT Pub. No. WO2020/173641, PCT Pub. Date Sep. 3, 2020.
Claims priority of application No. 19159362 (EP), filed on Feb. 26, 2019.
Prior Publication US 2022/0187719 A1, Jun. 16, 2022
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70725 (2013.01) [G03F 7/70483 (2013.01); G03F 7/70653 (2023.05); G03F 7/706835 (2023.05); G03F 9/7034 (2013.01)] 21 Claims
OG exemplary drawing
 
20. A lithographic apparatus comprising an inspection apparatus for inspecting an object configured to measure:
a first parameter of the object across an area of interest of the object; and
a second parameter, different from the first parameter, of the object at a plurality of different locations on the object; and
a stage apparatus configured to position the object during a measurement of the first parameter,
wherein the inspection apparatus is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter,
wherein the stage apparatus is configured to position the object based on a compliance characteristic of the stage apparatus,
wherein the stage apparatus comprises a control system, and
wherein the control system is configured to move the object at a first non-zero velocity during the measurement of the first parameter and at a second non-zero velocity, different from the first non-zero velocity, during the measurement of the second parameter.