CPC G02F 1/3505 (2021.01) [G01J 3/108 (2013.01); G02F 1/3503 (2021.01); G02F 1/3551 (2013.01); G02F 1/3556 (2013.01); G02F 1/3558 (2013.01); H01S 3/0092 (2013.01); H01S 3/2232 (2013.01); H01S 5/0092 (2013.01); H01S 5/14 (2013.01); H01S 5/3402 (2013.01); G02F 2202/101 (2013.01); G02F 2203/11 (2013.01)] | 19 Claims |
1. A laser source comprising:
a first laser device configured to generate a first laser beam having a first wavelength;
a second laser device configured to generate a second laser beam having a second wavelength, which is different from the first wavelength; and
a non-linear crystal configured to receive simultaneously the first and second laser beams and to generate a third laser beam that has a third wavelength, which is larger than each of the first and second wavelengths,
wherein the non-linear crystal has a length and a width, and a variable poling period is distributed across the width so that the third wavelength varies within a given wavelength range based on an incident position of the first and second laser beams along the width of the non-linear crystal, and
wherein the given wavelength range is between 11.56 and 15 μm.
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