CPC C23C 14/3492 (2013.01) [C23C 14/3407 (2013.01); C23C 14/50 (2013.01); C23C 14/54 (2013.01); C23C 14/542 (2013.01); C23C 14/56 (2013.01); H01J 37/32403 (2013.01); H01J 37/3417 (2013.01)] | 9 Claims |
1. A device for homogeneously coating surfaces of 3D substrates in a vacuum chamber, the device comprising:
an elongated sputtering source having one end and another end, the elongated sputtering source being fastened at the one end to a source connection adapter and at the other end to a counter-bearing, the counter-bearing being supported, via a counter-bearing receptable, by the source connection adapter;
a tube connection connected to the source connection adapter;
a doubly-angled pivoting tube, wherein the tube connection connects the source connection adapter to one end of the doubly-angled pivoting tube;
a pivoting tube drive coupled to another end of the doubly-angled pivoting tube and forming a virtual axis of rotation D about which the doubly-angled pivoting tube is able to be pivoted, the virtual axis of rotation extending longitudinally through the elongated sputtering source;
a pivoting-motor/gearing unit coupled to the pivoting tube drive;
a displacement tube, the pivoting-motor/gearing unit being arranged at one end of the displacement tube, and another end of the displacement tube being coupled to an inner chamber wall of the vacuum chamber as a fixed point;
wherein pivoting of the doubly-angled pivoting tube about the virtual axis of rotation D results in rotation of the sputtering source about the same axis of rotation, without causing a change in spatial position in relation to a 3D substrate, the 3D substrate being able to be moved past the elongated sputtering source in a translational manner at a defined spacing for coating of the 3D substrate, the 3D substrate having a curved substrate surface to be coated that is directed towards the elongated sputtering source; and
wherein the elongated sputtering source can be steplessly pivoted in a predefined angle range to set a predefined inclination angle and to be continuously set in operation at a desired spacing to the inner chamber wall or a desired spacing to the 3D substrate to be coated.
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