US 12,238,848 B2
EUV light source target metrology
Robert Jay Rafac, Encinitas, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/016,553
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Jul. 23, 2021, PCT No. PCT/EP2021/070671
§ 371(c)(1), (2) Date Jan. 17, 2023,
PCT Pub. No. WO2022/023201, PCT Pub. Date Feb. 3, 2022.
Claims priority of provisional application 63/058,987, filed on Jul. 30, 2020.
Claims priority of provisional application 63/212,793, filed on Jun. 21, 2021.
Prior Publication US 2023/0300965 A1, Sep. 21, 2023
Int. Cl. H05G 2/00 (2006.01)
CPC H05G 2/008 (2013.01) [H05G 2/003 (2013.01)] 20 Claims
OG exemplary drawing
 
1. Apparatus for aligning a target of target material and a beam of conditioning radiation, the apparatus comprising:
a source of structured conditioning radiation; and
an analyzer arranged to receive a beam of the structured conditioning radiation produced from the beam of conditioning radiation after the beam of structured conditioning radiation has interacted with the target and adapted to analyze a polarization of the interacted structured conditioning radiation to determine an alignment of the target and the beam of structured conditioning radiation.