| CPC H01L 22/20 (2013.01) [H01L 25/0753 (2013.01); H01L 2223/54426 (2013.01)] | 25 Claims |

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1. A method of aligning a first substrate and a second substrate comprising:
positioning the first substrate in close proximity to the second substrate, wherein the first substrate has at least a first alignment mark comprising four plates and wherein the second substrate has at least a second alignment mark comprising a single plate, and wherein the close proximity is a proximity at which the first alignment mark and the second alignment mark form a capacitance;
measuring an alignment value between the first and second alignment marks of both the first and second substrate; and
adjusting the position of the first substrate and the second substrate based on the measured alignment value.
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