US 12,237,180 B2
Apparatus for treating substrate
Jun Young Choi, Chungcheongbuk-do (KR); and Kyu Hwan Chang, Chungcheongnam-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Nov. 30, 2021, as Appl. No. 17/539,070.
Claims priority of application No. 10-2020-0164371 (KR), filed on Nov. 30, 2020; and application No. 10-2021-0085966 (KR), filed on Jun. 30, 2021.
Prior Publication US 2022/0172966 A1, Jun. 2, 2022
Int. Cl. H01L 21/67 (2006.01); B08B 7/00 (2006.01)
CPC H01L 21/67051 (2013.01) [B08B 7/0021 (2013.01); H01L 21/67057 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a first treating part performing a liquid treatment on a plurality of substrates in a batch-type treating method; and
a second treating part treating the substrates which have been treated at the first treating part, and performing a liquid treatment or a drying treatment on a single substrate in a single-type treating method,
wherein the first treating part comprises:
a treating bath having a containing space to contain the treating liquid;
a storage container submerged in the treating liquid contained in the containing space and having a storage space for storing the substrates; and
a posture changing member rotating the storage container submerged in the treating liquid, and
wherein the posture changing member comprises:
a rotation unit installable on the storage container and rotating the storage container; and
a moving unit installed on the treating bath and moving the storage container installed on the rotation unit in a horizontal direction.