US 12,237,166 B2
Methods for selective removal of surface oxides on metal films
Omid Zandi, Austin, TX (US); Paul Abel, Austin, TX (US); and Mengistie Debasu, Austin, TX (US)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jun. 13, 2022, as Appl. No. 17/838,440.
Prior Publication US 2023/0402276 A1, Dec. 14, 2023
Int. Cl. H01L 21/02 (2006.01); C23G 1/10 (2006.01)
CPC H01L 21/0206 (2013.01) [C23G 1/10 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A method for removing a native oxide formed on a surface of a metal film, the method comprising:
receiving a substrate having the metal film exposed on a surface of the substrate, wherein the native oxide is formed on the surface of the metal film;
exposing the surface of the substrate to a dissolution solution comprising a ligand dissolved in a non-aqueous solvent, wherein the ligand complexes with the native oxide to form a ligand-metal complex, which is soluble within and selectively dissolved by the non-aqueous solvent; and
rinsing the substrate with a second non-aqueous solvent to remove the dissolution solution and the ligand-metal complex from the surface of the substrate, thereby leaving a metallic surface or a ligand-bound passivating monolayer on the metal film.