| CPC H01J 37/32128 (2013.01) [H01J 37/32146 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32577 (2013.01); H01J 37/32715 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/6831 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3341 (2013.01)] | 21 Claims |
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1. A plasma processing chamber, comprising:
a substrate support assembly comprising a first electrode that is disposed a first distance from a substrate supporting surface of the substrate support assembly;
a first pulsed-voltage (PV) waveform generator electrically coupled to the first electrode;
a second pulsed-voltage waveform generator electrically coupled to a second electrode disposed in the substrate support assembly radially outward of the first electrode; and
a controller comprising a memory that includes computer program instructions stored therein, and the computer program instructions when executed by a processor of the controller cause:
a delivery, by use of the second pulsed-voltage waveform generator, of a series of voltage waveform pulses to the second electrode, wherein
the series of voltage waveform pulses comprise a first series of voltage waveform pulses and a second series of voltage waveform pulses,
the first series of voltage waveform pulses comprise a first burst duration and the second series of voltage waveform pulses comprise a second burst duration,
the first series of voltage waveform pulses comprises a first direct current power level and a first voltage waveform pulses duration, and
the second series of voltage waveform pulses comprises a second direct current power level and a second voltage waveform pulses duration, and
a delivery, by use of the first pulsed-voltage waveform generator, of a series of voltage waveform pulses to the first electrode, wherein
the series of pulsed voltage waveform pulses comprise a third series of voltage waveform pulses fourth series of voltage waveform pulses,
the third series of voltage waveform pulses comprise a third burst duration and the fourth series of voltage waveform pulses comprise a fourth burst duration,
the third series of voltage waveform pulses comprises a third direct current power level and a third voltage waveform pulses duration, and
the fourth series of voltage waveform pulses comprises a fourth direct current power level and a fourth voltage waveform pulses duration, and
wherein
the first and the second series of voltage waveform pulses each comprise a plurality of voltage pulses that comprise a first voltage pulse phase and a second voltage pulse phase, and during the second voltage pulse phase the first pulsed-voltage waveform generator establishes a negative voltage at the first electrode,
the third and the fourth series of voltage waveform pulses each comprise a plurality of voltage pulses that comprise the first voltage pulse phase and the second voltage pulse phase, and during the second voltage pulse phase the second pulsed-voltage waveform generator establishes a negative voltage at the second electrode.
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