| CPC H01J 1/146 (2013.01) [C04B 41/0054 (2013.01); C04B 41/009 (2013.01); C04B 41/91 (2013.01); H01J 1/025 (2013.01); H01J 9/042 (2013.01); C04B 2235/3804 (2013.01)] | 23 Claims |

|
1. A method for treating a polycrystalline material, the method comprising:
exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein:
the surface comprises a plurality of crystallites each having a composition MB6, M being a metal element;
the plasma comprises ions, the ions being characterized by an average ion flux selected from a range of 1.5 to 100 A/cm2 and an average ion energy that is less than a sputtering threshold energy of the plurality of MB6 crystallites in a presence of said plasma;
the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and
the second average work function is less than the first average work function.
|