US 12,236,364 B2
Metrology and process control for semiconductor manufacturing
Eitan Rothstein, Rehovot (IL); Ilya Rubinovich, Rehovot (IL); Noam Tal, Rehovot (IL); Barak Bringoltz, Rehovot (IL); Yongha Kim, Rehovot (IL); Ariel Broitman, Rehovot (IL); Oded Cohen, Rehovot (IL); Eylon Rabinovich, Rehovot (IL); Tal Zaharoni, Rehovot (IL); Shay Yogev, Rehovot (IL); and Daniel Kandel, Rehovot (IL)
Assigned to NOVA LTD, Rehovot (IL)
Filed by NOVA LTD, Rehovot (IL)
Filed on Sep. 18, 2023, as Appl. No. 18/369,221.
Application 18/369,221 is a continuation of application No. 17/400,157, filed on Aug. 12, 2021, granted, now 11,763,181.
Application 17/400,157 is a continuation of application No. 16/973,092, granted, now 11,093,840, issued on Aug. 17, 2021, previously published as PCT/IB2019/054994, filed on Jun. 14, 2019.
Claims priority of provisional application 62/684,817, filed on Jun. 14, 2018.
Prior Publication US 2024/0078450 A1, Mar. 7, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G06N 5/04 (2023.01); G01B 11/06 (2006.01); G03F 7/00 (2006.01); G06N 20/00 (2019.01); H01L 21/66 (2006.01); H01L 21/68 (2006.01)
CPC G06N 5/04 (2013.01) [G01B 11/06 (2013.01); G03F 7/705 (2013.01); G03F 7/70616 (2013.01); G06N 20/00 (2019.01); H01L 21/681 (2013.01); H01L 22/26 (2013.01); G01B 2210/56 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A high-volume manufacturing semiconductor process control metrology system comprising:
a plurality of spectrum acquisition integrated metrology (IM) tools configured to collect, in accordance with a first measurement protocol, a baseline set of scatterometric spectra;
at least one reference metrology tool configured to provide, in accordance with a second measurement protocol, values of predefined parameters of semiconductor wafer targets;
at least one web server layer connectable to said integrated metrology tools and said at least one reference metrology tool;
a big data layer configured for storing and processing data in a scalable and distributed manner; and
a training unit configured to create a training set of the data from the collected sets of spectra and said values of the predefined parameters.