US 12,235,595 B2
Systems for cleaning a portion of a lithography apparatus
Daniel Paul Rodak, Milford, CT (US)
Assigned to ASML HOLDING N.V., Veldhoven (NL)
Appl. No. 17/771,044
Filed by ASML HOLDING N.V., Veldhoven (NL)
PCT Filed Oct. 20, 2020, PCT No. PCT/EP2020/079526
§ 371(c)(1), (2) Date Apr. 22, 2022,
PCT Pub. No. WO2021/089320, PCT Pub. Date May 14, 2021.
Claims priority of provisional application 62/931,864, filed on Nov. 7, 2019.
Prior Publication US 2022/0390860 A1, Dec. 8, 2022
Int. Cl. G03F 7/00 (2006.01); B08B 1/14 (2024.01); B08B 7/00 (2006.01); B08B 13/00 (2006.01)
CPC G03F 7/70925 (2013.01) [B08B 1/143 (2024.01); B08B 7/0028 (2013.01); B08B 13/00 (2013.01); G03F 7/70733 (2013.01); G03F 7/70808 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system for cleaning a portion of a lithography apparatus, the system comprising:
a cleaning tool, the cleaning tool configured to be inserted into the lithography apparatus in a first configuration, configured to be engaged by a handler of the lithography apparatus, and used for cleaning the portion of the lithography apparatus;
wherein the cleaning tool is configured to move from the first configuration to a second, expanded configuration, after engagement by the handler, and prior to any contact of the cleaning tool with the portion, such that the cleaning tool is in the second configuration when used for cleaning the portion of the lithography apparatus.