| CPC G03F 7/70875 (2013.01) [G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/707 (2013.01); G03F 7/70891 (2013.01)] | 20 Claims |

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7. A system for dynamically controlling a temperature of a thermostatic reticle, comprising:
a thermostatic reticle assembly positioned within an extreme ultraviolet lithography (EUV) process chamber, comprising:
a clamp;
a reticle removably coupled to the clamp;
at least one temperature sensor in proximity to the reticle; and
at least one heating element positioned between the clamp and the reticle, and the at least one heating element affixed to a top of the reticle;
a thermostat component in communication with the at least one temperature sensor and the at least one heating element; and
a controller comprising a processor in communication with memory storing instructions which are executed by the processor to:
identify, via a machine learning component, the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography;
retrieve, from an associated database, a steady-state temperature corresponding to the reticle and recipe;
receive, from the at least one temperature sensor by the thermostat component, a current temperature of the reticle,
activate, via the thermostat component, the at least one heating element to preheat the reticle to the retrieved steady-state temperature in accordance with the current temperature of the reticle;
receive, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element;
deactivate the at least one heating element responsive to the temperature of the reticle reaching the steady state temperature;
receive, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element;
compare the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and
activate a chiller component in response to a result of the comparison.
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