US 12,235,586 B2
EUV photolithography system fuel source and methods of operating the same
Cheng-Hao Lai, Hsinchu (TW); Ming-Hsun Tsai, Hsinchu (TW); Hsin-Feng Chen, Hsinchu (TW); Wei-Shin Cheng, Hsinchu (TW); Yu-Kuang Sun, Hsinchu (TW); Cheng-Hsuan Wu, Hsinchu (TW); Yu-Fa Lo, Hsinchu (TW); Shih-Yu Tu, Hsinchu (TW); Jou-Hsuan Lu, Hsinchu (TW); Shang-Chieh Chien, Hsinchu (TW); Li-Jui Chen, Hsinchu (TW); and Heng-Hsin Liu, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 7, 2023, as Appl. No. 18/366,092.
Application 18/366,092 is a continuation of application No. 17/494,558, filed on Oct. 5, 2021, granted, now 11,809,083.
Claims priority of provisional application 63/175,995, filed on Apr. 16, 2021.
Prior Publication US 2023/0375938 A1, Nov. 23, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70033 (2013.01) 20 Claims
OG exemplary drawing
 
1. A method of processing fuel in an EUV photolithography system, the method comprising:
collecting a liquid fuel in a vessel, the liquid fuel including impurities;
collecting the impurities in the liquid fuel; and
suctioning the impurities out of the vessel.