US 12,235,584 B2
Chemical liquid, chemical liquid storage body, resist pattern forming method, and semiconductor chip manufacturing method
Tetsuya Kamimura, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Mar. 31, 2021, as Appl. No. 17/219,805.
Application 17/219,805 is a continuation of application No. PCT/JP2019/034756, filed on Sep. 4, 2019.
Claims priority of application No. 2018-188517 (JP), filed on Oct. 3, 2018.
Prior Publication US 2021/0223698 A1, Jul. 22, 2021
Int. Cl. G03F 7/32 (2006.01); B65D 1/02 (2006.01); G03F 7/42 (2006.01)
CPC G03F 7/325 (2013.01) [G03F 7/422 (2013.01); B65D 1/0207 (2013.01)] 22 Claims
 
1. A chemical liquid comprising:
pentyl acetates;
n-butyl acetate; and
isobutyl acetate,
wherein a content of the n-butyl acetate is 99.000% to 99.999% by mass with respect to a total mass of the chemical liquid, and
a content of the isobutyl acetate is 1.0 to 1,000 mass ppm with respect to the total mass of the chemical liquid.