US 12,235,492 B2
Wafer-scale-integrated silicon-photonics-based optical switching system and method of forming
Tae Joon Seok, Berkeley, CA (US); and Ming Chiang A Wu, Moraga, CA (US)
Assigned to The Regents of the University of California, Oakland, CA (US)
Filed by The Regents of the University of California, Oakland, CA (US)
Filed on May 16, 2024, as Appl. No. 18/665,950.
Application 18/665,950 is a continuation of application No. 18/206,343, filed on Jun. 6, 2023, granted, now 11,994,720.
Application 18/206,343 is a continuation of application No. 17/839,173, filed on Jun. 13, 2022, granted, now 11,693,188, issued on Jul. 4, 2023.
Application 17/839,173 is a continuation of application No. 16/768,233, granted, now 11,360,272, issued on Jun. 14, 2022, previously published as PCT/US2018/063127, filed on Nov. 29, 2018.
Claims priority of provisional application 62/592,815, filed on Nov. 30, 2017.
Prior Publication US 2024/0302598 A1, Sep. 12, 2024
Int. Cl. G02B 6/35 (2006.01); G02B 6/12 (2006.01); G02B 6/293 (2006.01)
CPC G02B 6/3546 (2013.01) [G02B 6/3508 (2013.01); G02B 6/12007 (2013.01); G02B 2006/12145 (2013.01); G02B 6/29344 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A monolithically integrated photonics system on a substrate, the system comprising:
a first bus waveguide in a first region that is characterized by a first lithography reticle that is no larger than a maximum reticle size, the first bus waveguide having a first width and including a first coupling portion having a second width and a first taper region that optically couples the first bus waveguide and the first coupling portion;
a second bus waveguide in a second region that is characterized by a second lithography reticle that is no larger than the maximum reticle size, the second bus waveguide having the first width and including a second coupling portion having the second width and a second taper region that optically couples the second bus waveguide and the second coupling portion; and
a first coupling region that includes the first and second coupling portions;
wherein the first region abuts the second region such that the first and second bus waveguides are optically coupled via the first coupling region; and
wherein the system occupies an area that exceeds the maximum reticle size.