US 12,235,223 B2
Method for defect inspection, system, and computer-readable medium
Takanori Kondo, Tokyo (JP); Nobuhiro Obara, Tokyo (JP); and Takahiro Urano, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Appl. No. 17/925,624
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
PCT Filed Jun. 12, 2020, PCT No. PCT/JP2020/023173
§ 371(c)(1), (2) Date Nov. 16, 2022,
PCT Pub. No. WO2021/250884, PCT Pub. Date Dec. 16, 2021.
Prior Publication US 2023/0175981 A1, Jun. 8, 2023
Int. Cl. G01N 21/95 (2006.01); G01N 21/47 (2006.01); G01N 21/88 (2006.01)
CPC G01N 21/9501 (2013.01) [G01N 21/47 (2013.01); G01N 2021/8854 (2013.01); G01N 2021/888 (2013.01); G01N 2021/8883 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A defect inspection method for inspecting a defect on a sample based on output information of multiple detectors, each of which is configured to detect a scattered light generated by irradiation of the sample with a light, using one or more computers, the defect inspection method comprising the steps of:
receiving outputs of multiple detectors arranged at multiple elevation angles to a surface of the sample, and in multiple azimuths to an irradiation point of the light on the sample in a direction to the surface of the sample; and
inputting output information of the multiple detectors to a data processing section, by which a learning device is executed, and the learning device is trained using the output information of the multiple detectors and defect information, and outputting the defect information;
wherein when the same sample is inspected multiple times, the one or more computers applies a label indicating a defect of interest to the output information having a defect detection capture rate equal to or larger than a predetermined value, and applies a label indicating a nuisance to the output information having the capture rate smaller than the predetermined value.