US 12,235,096 B2
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
Henricus Petrus Maria Pellemans, Veldhoven (NL); and Arie Jeffrey Den Boef, Waalre (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Oct. 13, 2023, as Appl. No. 18/486,811.
Application 15/913,253 is a division of application No. 14/536,979, filed on Nov. 10, 2014, granted, now 9,933,250, issued on Apr. 3, 2018.
Application 18/486,811 is a continuation of application No. 17/692,974, filed on Mar. 11, 2022, granted, now 11,828,585.
Application 17/692,974 is a continuation of application No. 16/817,552, filed on Mar. 12, 2020, granted, now 11,307,024, issued on Apr. 19, 2022.
Application 16/817,552 is a continuation of application No. 16/168,355, filed on Oct. 23, 2018, granted, now 10,591,283, issued on Mar. 17, 2020.
Application 16/168,355 is a continuation of application No. 15/913,253, filed on Mar. 6, 2018, granted, now 10,209,061, issued on Feb. 19, 2019.
Application 14/536,979 is a continuation of application No. 12/867,416, granted, now 8,885,150, issued on Nov. 11, 2014, previously published as PCT/EP2009/001141, filed on Feb. 18, 2009.
Claims priority of provisional application 61/064,312, filed on Feb. 27, 2008.
Prior Publication US 2024/0044639 A1, Feb. 8, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G01B 11/24 (2006.01); G03F 7/00 (2006.01)
CPC G01B 11/24 (2013.01) [G03F 7/70191 (2013.01); G03F 7/70633 (2013.01); G03F 7/7085 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A system comprising:
a means for producing a radiated spot on a target on a substrate;
a means for adjusting a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction, wherein the first and second directions are defined along a surface of the substrate;
a means for receiving radiation scattered from multiple locations of the target according to the adjusting the position of the radiated spot, wherein the multiple locations are defined along the surface of the substrate;
a means for generating measurement signals corresponding to the multiple locations of the target irradiated by the radiation spot;
a means for receiving the measurement signals;
a means for aggregating the measurement signals; and
a means for deriving a single value that is representative of a property of the target based on irradiation of the multiple locations of the target and the aggregating the measurement signals.