US 12,235,045 B2
Magnetic annealing equipment and method
Ian Colgan, Meath (IE); Ioan Domsa, Dublin (IE); George Eyres, Dublin (IE); Bartlomiej Burkowicz, Dublin (IE); Barry Clarke, Dublin (IE); David Hurley, Dublin (IE); and Einstein Noel Abarra, Tokyo (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Mar. 25, 2022, as Appl. No. 17/656,588.
Prior Publication US 2023/0304741 A1, Sep. 28, 2023
Int. Cl. H01L 21/00 (2006.01); F27B 17/00 (2006.01); F27D 3/00 (2006.01); H01L 21/324 (2006.01); F27D 7/06 (2006.01)
CPC F27B 17/0025 (2013.01) [F27D 3/0084 (2013.01); H01L 21/324 (2013.01); F27D 2007/066 (2013.01)] 20 Claims
OG exemplary drawing
 
1. Equipment for magnetic annealing of a substrate, the equipment comprising:
an anneal chamber configured to heat and cool the substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber comprising:
a heater configured to move along the first direction relative to the substrate held at the soak location,
a cooler configured to move along the first direction relative to the substrate held at the soak location, and
a substrate lifter comprising a substrate holder, wherein the substrate holder is configured to support the substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and
a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone comprising a region of magnetic field.