US 12,234,553 B2
CVD reactor with carrying ring for substrate handling, and use of a carrying ring on a CVD reactor
Benjamin David Wright, Cambridge (GB); and Barry O'Neil, Herzogenrath (DE)
Assigned to AIXTRON SE, Herzogenrath (DE)
Appl. No. 15/734,736
Filed by AIXTRON SE, Herzogenrath (DE)
PCT Filed Jun. 4, 2019, PCT No. PCT/EP2019/064392
§ 371(c)(1), (2) Date Dec. 3, 2020,
PCT Pub. No. WO2019/233965, PCT Pub. Date Dec. 12, 2019.
Claims priority of application No. 10 2018 113 400.2 (DE), filed on Jun. 6, 2018.
Prior Publication US 2021/0238740 A1, Aug. 5, 2021
Int. Cl. C23C 16/458 (2006.01); C23C 16/32 (2006.01)
CPC C23C 16/4585 (2013.01) [C23C 16/325 (2013.01); C23C 16/4584 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A device for depositing layers composed of decomposition products of gaseous starting materials onto a substrate (10), the device comprising:
a reactor housing (1);
a process chamber (2); and
a susceptor assembly (3) arranged in the reactor housing (1), the susceptor assembly (3) comprising:
a wide side plane (15′) which faces the process chamber (2);
a pocket (17); and
a carrying element (20) lying in the pocket (17),
wherein an upper face (26) of the carrying element (20) extending parallel to the wide side plane (15′) is adjacent to a limiting face (24) of a recess (11) adapted to receive the substrate (10),
wherein a cylindrical surface of the limiting face (24) transitions into the upper face (26) of the carrying element (20) with a transitional area that is free of kinks and has a radius (R) greater than 0.4 mm, and
wherein a support surface (23) formed by a radially inner area (22) of the carrying element (20) is spaced apart from the upper face (26) by a distance (b) greater than 1 mm.