US 12,234,549 B2
Method of in situ ceramic coating deposition
Sarah Michelle Bobek, Sunnyvale, CA (US); Abdul Aziz Khaja, San Jose, CA (US); Ratsamee Limdulpaiboon, San Jose, CA (US); and Kwangduk Douglas Lee, Redwood City, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 5, 2023, as Appl. No. 18/143,648.
Application 18/143,648 is a continuation of application No. 17/036,865, filed on Sep. 29, 2020, granted, now 11,674,222.
Prior Publication US 2023/0272525 A1, Aug. 31, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/40 (2006.01); C23C 16/32 (2006.01); C23C 16/44 (2006.01); H01L 21/033 (2006.01)
CPC C23C 16/4404 (2013.01) [C23C 16/325 (2013.01); H01L 21/0337 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
introducing a treatment gas to a process volume of a process chamber, wherein the treatment gas comprises a silane gas and an oxygen-containing gas;
energizing the silane gas using a silane flow (sccm) to power (W) ratio of less than 0.07, wherein energizing the silane gas forms a silicon oxide (SiOx) film over a process chamber component; and
introducing a carbon-containing gas to the process volume to form a silicon-and-carbon-containing film on the process chamber component.